Modeling and Simulation of Fast Neutral Beam Sources for Materials Processing
نویسنده
چکیده
Fast (kinetic energy of 10 to some 100 eV) neutral beams can be used for etching, deposition or surface modification, without charging damage that may occur in conventional plasma processing of materials. This paper provides an overview of the modeling and simulation approaches applicable to neutral beam sources. Neutral beam sources based on both volume and surface neutralization of ions are discussed, with emphasis on the latter.
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